I-Gallium oxide | |
Ifomula yamakhemikhali | I-Ga2O3 |
I-Molar mass | 187.444 g/mol[1] |
Ukubukeka | i-crystalline powder emhlophe |
Ukuminyana | 6.44 g/cm3, alpha;5.88 g/cm3, i-beta |
Iphoyinti lokuncibilika | 1,900°C (3,450°F; 2,170K) i-alpha;1725°C, i-beta |
Ukuncibilika emanzini | engancibiliki |
Ukuncibilika | encibilika kuma-asidi amaningi |
Ukucaciswa kwekhwalithi ephezulu ye-Gallium oxide
Into No. | Ukwakheka Kwamakhemikhali | Usayizi Wezinhlayiyana | ||||||||
I-Ca2O3 | Mat.(Umphumela Wokuhlola) PPM | D50 | ||||||||
(wt%) | Ni | Cu | Ca | Fe | Zn | In | Mn | Cr | μm | |
UMGO4N | ≥99.99% | 8.2 | 3.8 | 2.5 | 2.4 | 0.8 | 0.4 | 0.1 | 0.1 | 3.82 |
Ukupakisha: 25kg / ibhodlela lepulasitiki, 20 ibhodlela / ibhokisi.
Isetshenziselwani i-Gallium Oxide?
I-Gallium oxideisetshenziswa kuma-lasers, ama-phosphors, nezinto ze-luminescent.I-Monoclinic ß-Ga2O3 isetshenziswe ezinzwa zegesi, i-luminescent phosphor kanye nezingubo ze-dielectric zamaseli elanga.Njenge-oxide ezinzile, iphinde ibe namandla e-deep-ultraviolet transparent conductive oxides, kanye nezinhlelo zokusebenza ze-transistor.Amafilimu amaThin Ga2O3 anentshisekelo yokuhweba njengezinto ezizwela igesi.I-ß-Gallium(III) oxide isetshenziswa ekukhiqizeni i-Ga2O3-Al2O3 catalyst.Futhi iyatholakala: I-Gallium Oxide Sputtering Targets Ga2O3.